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Canon Unveils Advanced Lithography System to Boost Semiconductor Production

Algoine News
Summary:
Canon, the noted Japanese firm, has launched a "nanoimprint lithography" system to assist in producing advanced semiconductor parts. This marks the company's competitive response to the Dutch company ASML, a leader in the EUV lithography machine sector. Canon's new system, the FPA-1200NZ2C, claims to manufacture semiconductors using a 5nm process while scaling down to 2nm, surpassing the performance of Apple's latest A17 Pro chip. These inventions come amidst increased tech dispute between the US and China, with export restrictions impacting the production of high-end semiconductor chips.
Renowned Japanese enterprise, Canon, made public a crucial innovation on Friday, October 13, dedicated to supporting the creation of avant-garde semiconductor parts. CNBC reported that Canon's new "nanoimprint lithography" system is the company's answer to the Netherlands' company ASML, a powerhouse in the extreme ultraviolet (EUV) lithography equipment industry. ASML's technology plays a vital role in the manufacturing of high-end chips, including those incorporated in the most recent models of Apple iPhones. The usage of such machines has become a bone of contention amidst the tech clash between the US and China. By imposing various sanctions and export limitations, the US is actively preventing China from gaining access to vital chips and manufacturing machinery, thereby stunting the development of the world's second biggest economy in a field where it already falls behind. ASML's EUV tech has become popular among top chip makers due to its pivotal part in facilitating the development of 5 nanometers or smaller size semiconductors. The nanometer measurement indicates the chip features' size, with tinier figures allowing higher feature density, hence improving the semiconductor's capabilities. Canon claimed in a statement that its novel system, named FPA-1200NZ2C, can manufacture semiconductors using a 5nm process and scale down to 2nm, surpassing the performance of the A17 Pro chip integrated in the latest Apple iPhone 15 Pro and Pro Max, which is a 3nm device. The Dutch government has placed restrictions on ASML, banning the exportation of its EUV lithography machinery to China, with no units having been dispatched there till now. These restrictions are due to the essential part played by these machines in creating high-end semiconductor chips. As Canon declares its new machine's ability to assist in producing 2nm equivalent semiconductors, scrutiny is anticipated to amplify. In related news, as reported by Cointelegraph, the Biden administration is zeroing in on a loophole which enabled Chinese developers to acquire chips from the notorious Huaqiangbei electronics market in Shenzhen, a southern Chinese city. China has, however, issued draft security guidelines for businesses delivering generative artificial intelligence (AI) services, including limits on data sources used for AI model instruction.

Published At

10/15/2023 1:13:25 PM

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